
Tec-Lube
Tec-Lube shows remarkable chemical inertness. No evidence
of reactivity was observed between Tec-Lube and boiling sulfuric
acid, fluorine gas at 200° C, chlorine trifluoride at 10-50°
C, molten sodium hydroxide or any of the following at room
temperature: ethyl alcohol, hydrazine, aniline or nitrogen
tetroxide.
Tec-Lube does not interact to contaminate semiconductor devices
being processed in a system with free radicals such as NA++. |